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  • image Image source: /wordpress/wp-content/uploads/2009/05/BetaSights_Banner_Consulting2009_EK1.jpg

    Alternative text: Not defined!

  • image Image source: /wordpress/wp-content/uploads/2011/07/innovalight_silicon_ink.jpg

    Alternative text: Doped-silicon inks from DuPont Innovalight enable the production of selective emitter solar cells with the addition of a single screen printing step.

  • image Image source: /wordpress/wp-content/uploads/2011/06/rasirc_steamer_02.jpg

    Alternative text: RASIRC Steamer (source: RASIRC)

  • image Image source: /wordpress/wp-content/uploads/2011/04/shibuya_takuma2011.jpg

    Alternative text: Dr. Masato Shibuya won the Takuma Award 2011

  • image Image source: /wordpress/wp-content/uploads/2011/03/levenson_al11-wed-poster5.jpg

    Alternative text: The two inventors of the alternating phase-shift mask (alt-PSM) review a poster during SPIE AL 2011. Prof. Masato Shibuya (left) now of the Tokyo Institute of Polytechnics in Atsugi and formerly of Nikon shows his poster presentation to Dr. M. David Levenson (right) now of BetaSights and formerly of IBM (source: SPIE)

  • image Image source: /wordpress/wp-content/uploads/2011/03/spie11_mdl_rsadp_flow.jpg

    Alternative text: Recessive Self-Aligned Double Patterning (RSADP) process flow shown in cross-sectional schematics (source: Applied Materials)

  • image Image source: /wordpress/wp-content/uploads/2011/03/spie11_mdl_rsadp_sem1.jpg

    Alternative text: Recessive Self-Aligned Double Patterning (RSADP) results for contact holes density doubling to 50nm half pitch. (source: Applied Materials)

  • image Image source: /wordpress/wp-content/uploads/2011/03/spie11_mdl_nxe3100.jpg

    Alternative text: The ASML NXE:3100 EUVL stepper. (source: ASML)

  • image Image source: /wordpress/wp-content/uploads/2011/03/spie11_mdl_euvaltpsm.jpg

    Alternative text: EUV alternating Phase-Shift Mask (alt-PSM) work by Intel and LBL, a) mask cross-section, b) absorber and phase-edge resist images, and c) 22nm line-space patterns. (source: Intel)

  • image Image source: /wordpress/wp-content/uploads/2011/02/evg620hbl_alignmarks_sapphire.jpg

    Alternative text: HB-LED GaN-epi on sapphire marks, (LEFT) with conventional illumination, and (RIGHT) with new illumination in EVG620HBL tool. (source: EV Group)

  • image Image source: /wordpress/wp-content/uploads/2011/02/evg620hbl_maskaligner.jpg

    Alternative text: EVG620HBL mask aligner (source: EV Group)

  • image Image source: /wordpress/wp-content/uploads/2011/01/samsung_nand_sarp.jpg

    Alternative text: Samsung uses Self-Aligned Reverse Patterning (SARP) for 2Xnm node Flash chips (source: IEDM2010, S05P01)

  • image Image source: /wordpress/wp-content/uploads/2011/01/intelmicron_flash_trapstable.jpg

    Alternative text: Not defined!

  • image Image source: /wordpress/wp-content/uploads/2011/01/flashipdstack_ncsu_iedm2010.jpg

    Alternative text: TEM cross-section of a Flash memory cell showing ~4nm TaN floating-gate (FG) and hafnia-alumina-hafnia (HAH) inter-poly dielectric (IPD). (source: IEDM2010, S05P03)

  • image Image source: /wordpress/wp-content/uploads/2011/01/renesas_edram_mims.jpg

    Alternative text: Renesas' capacitor in porous low-k (CAPL) eliminates W bypass contacts for reduced eDRAM delay (source: IEDM2010, S33P03)

  • image Image source: /wordpress/wp-content/uploads/2011/01/renesas_edram_caplflow.jpg

    Alternative text: Renesas' capacitor in porous low-k (CAPL) eDRAM structure requires careful control of the etch process to provide smooth sidewalls with a bottom angle of ~88° for void-free filling. (source: IEDM2010, S33P03)

  • image Image source: /wordpress/wp-content/uploads/2010/12/iedm2010_graphene_ibm.jpg

    Alternative text: IBM's dual-gated bi-layer graphene device structure (source: IEDM2010)

  • image Image source: /wordpress/wp-content/uploads/2010/12/iedm2010_graphene_columbia.jpg

    Alternative text: Columbia U.'s BN top-gate for graphene (source: IEDM2010)

  • image Image source: /wordpress/wp-content/uploads/2010/12/iedm2010_graphene_mit.jpg

    Alternative text: MIT's graphene on insulator FET formed by layer-transfer from from a sacrificial Cu-foil (source: IEDM2010)

  • image Image source: /wordpress/wp-content/uploads/2010/12/iedm2010_graphene_ibmmit.jpg

    Alternative text: Modeling of gm by varying Rs for 70 nm and 1 ?m devices and the improvement of projected fT. (source: IEDM2010)

  • image Image source: /wordpress/wp-content/uploads/2010/12/ibm_semtech_tsvinterposer.jpg

    Alternative text: (IBM's silicon-interposers using Cu TSV along with deep trench capacitors (source: BusinessWire)

  • image Image source: /wordpress/wp-content/uploads/2010/12/iedm2010_s2p2_imec_tsv.jpg

    Alternative text: Schematic of the gate stack under test and the main technology options implemented in our 300mm High-k/ Metal Gate First CMOS 3DIC via middle baseline. CMOS is done until contact level then the Cu-TSV module is inserted, followed by BEOL. (source: IEDM2010, Session2.1)

  • image Image source: /wordpress/wp-content/uploads/2010/12/iedm2010_s2p2_imec_tsvkoz.jpg

    Alternative text: Keep out zone for analog devices with 0.5% delta-Ion sensitivity threshold and for digital devices with 5% delta-Ion sensitivity threshold as a function of the number of TSVs in the matrix. (source: IEDM2010, Session2.1)

  • image Image source: /wordpress/wp-content/uploads/2010/11/centris_overview_abatement.jpg

    Alternative text: Schematic of the new Centris platform for AdvantEdge MESA etch chambers (source: Applied Materials)

  • image Image source: /wordpress/wp-content/uploads/2010/11/centris_dpetch_sem.jpg

    Alternative text: SEM cross-section of NAND STI structures etched using double-patterning and the MESA Pulsync technology to minimize micro-loading (source: Applied Materials)

  • image Image source: /wordpress/wp-content/uploads/2010/11/qceptchemetriq_5000_website_000.jpg

    Alternative text: ChemetriQ 5000 patterned wafer work-function metrology tool. (Source: Qcept Technologies)

  • image Image source: /wordpress/wp-content/uploads/2010/11/qcept_2010pr_wafermap1.jpg

    Alternative text: ChemetriQ charge map of a 45nm node GlobalFoundries CMP wafer from a malfunctioning cleaning tool. The dark blue region at the center was charged to -4.5V, which was sufficient to cause yield loss of all the dice in that region. Prior to this charge map being generated, GlobalFoundries had taken this tool offline because of the yield issue with no correlating defectivity reported by optical inspection tools used at the fab. (Source: Qcept Technologies)

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Technology profile

  • Wordpress CMS
  • CSS (Cascading Style Sheets)
  • Html (HyperText Markup Language)
  • Javascript
  • Php (Hypertext Preprocessor)
  • Pingback
  • SVG (Scalable Vector Graphics)

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Betasight.net Domain Owner

						
betasight.net domain lookup results from whois.verisign-grs.net server:

Domain Name: BETASIGHT.NET
Registry Domain ID: 1457699757_DOMAIN_NET-VRSN
Registrar WHOIS Server: whois.names4ever.com
Registrar URL: http://www.aplus.net
Updated Date: 2017-04-25T05:06:57Z
Creation Date: 2008-04-25T12:16:07Z
Registry Expiry Date: 2018-04-25T12:16:07Z
Registrar: Deluxe Small Business Sales, Inc. d/b/a Aplus.net
Registrar IANA ID: 52
Domain Status: ok https://icann.org/epp#ok
Name Server: NS1.ABAC.COM
Name Server: NS2.ABAC.COM
DNSSEC: unsigned
URL of the ICANN Whois Inaccuracy Complaint Form: https://www.icann.org/wicf/
>>> Last update of whois database: 2017-08-22T06:16:36Z

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